SHAANXI LASTING TITANIUM INDUSTRY CO., LTD.
Tel: +86 29 89651035E-mail: email@example.com
Our standard Sputtering Targets for thin film are available
monoblock or bonded with planar target dimensions and
configurations up to 820 mm with hole drill locations and
threading, beveling, grooves and backing designed to work with both
older sputtering devices as well as the latest process equipment,
such as large area coating for solar energy or fuel cells and
Research sized targets are also produced as well as custom sizes
and alloys. All targets are analyzed using best demonstrated
techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass
Spectrometry (GDMS), and Inductively Coupled Plasma (ICP).
"Sputtering" allows for thin film deposition of an ultra high
purity sputtering metallic or oxide material onto another solid
substrate by the controlled removal and conversion of the target
material into a directed gaseous/plasma phase through ionic
We can also provide targets outside this range in addition to just
about any size rectangular, annular, or oval target. Materials are
produced using crystallization, solid state and other ultra high
purification processes such as sublimation.
We also produce Titanium as rods, powder and plates. Other shapes
are available by request.
Hot Tags: Titanium sputtering Target ,New Products R & D CP
Titanium Sputtering Target,Shaanxi Lasting Titanium