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Al 99.5% sputtering target in rod condition target for vacuum PVD

Categories Sputtering Target
Place of Origin: china
Brand Name: Hongtech-TI
Certification: ISO,CE,GSG,MTC
Model Number: 1pc
MOQ: 1pc
Price: usd25/kg
Packaging Details: packed in wodden case
Delivery Time: 15-20days
Payment Terms: L/C,T/T
Supply Ability: 50KG/Month
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    Al 99.5% sputtering target in rod condition target for vacuum PVD

    Al 99.5% sputtering target in rod condition target for vacuum PVD

    1.Materials:

    1)Pure Titanium target,Gr1 Gr2 Purity:Ranging from 99.8%

    2)TiAl alloy target 50:50at%, 80:20at%, 70:30at%, 60:40at%,

    2.Standard:

    ASTM348

    3.Features

    High strength, high corrosion resistance, low density


    4.Applications

    Mainly used in galvanizing,Electroplating ,the vacuum coating decoration and the function coating industuy and other coating


    Item name

    Grade

    Shape

    Purity

    Pure Ti target

    GR1

    Round target,

    plate target,

    tube target

    Ranging from 99.5%(2N5) - 99.995%(4N5)

    GR2

    4NTi

    Titanium alloy target

    TiNb (GR36)

    50:50at%,80:20at%,70:30at%,60:40at%,

    TiZr alloy target

    TiAl alloy target


    Round Target in rod condition:

    1) Dia:60-200mm

    2) Thickness:30-50mm

    Material

    Shape

    Size

    Ti Target

    round

    Dia:60-200mm Thickness:30-50mm

    Or according to the demand

    Ni Target

    Zr Target


    Plate Target:

    1) Length:200-400mm

    2) Width:100-200

    3) Thickness:15-30mm

    Material

    Shape

    Size

    Ti Target


    Length:200-400mm

    Width:100-200

    Thickness:15-30mm

    Or according to the demand




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