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Al 99.5% sputtering target in rod condition target for vacuum PVD

Categories Sputtering Target
Place of Origin: china
Brand Name: Hongtech-TI
Certification: ISO,CE,GSG,MTC
Model Number: 1pc
MOQ: 1pc
Price: usd25/kg
Packaging Details: packed in wodden case
Delivery Time: 15-20days
Payment Terms: L/C,T/T
Supply Ability: 50KG/Month
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    Al 99.5% sputtering target in rod condition target for vacuum PVD

    Al 99.5% sputtering target in rod condition target for vacuum PVD


    1)Pure Titanium target,Gr1 Gr2 Purity:Ranging from 99.8%

    2)TiAl alloy target 50:50at%, 80:20at%, 70:30at%, 60:40at%,




    High strength, high corrosion resistance, low density


    Mainly used in galvanizing,Electroplating ,the vacuum coating decoration and the function coating industuy and other coating

    Item name




    Pure Ti target


    Round target,

    plate target,

    tube target

    Ranging from 99.5%(2N5) - 99.995%(4N5)



    Titanium alloy target

    TiNb (GR36)


    TiZr alloy target

    TiAl alloy target

    Round Target in rod condition:

    1) Dia:60-200mm

    2) Thickness:30-50mm




    Ti Target


    Dia:60-200mm Thickness:30-50mm

    Or according to the demand

    Ni Target

    Zr Target

    Plate Target:

    1) Length:200-400mm

    2) Width:100-200

    3) Thickness:15-30mm




    Ti Target




    Or according to the demand

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