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99.995% Pure Titanium Plate Titanium Sputtering Target

Categories Titanium Sputtering Target
Brand Name: jinxing matmetals
Certification: iso9001
Place of Origin: he nan
MOQ: 1 Kilogram
Price: USD35-60 Kilogram
Payment Terms: D/P, T/T, L/C, Western Union, MoneyGram
Supply Ability: 20000 Kilogram per Month
Delivery Time: 8-15Days
Packaging Details: in wooden case
Application: Vacuum coating
Grade: Pure Titanium
Product name: Titanium Sputtering Target
Purity: 99.995%
Technique: Smelting and casting
Density: 4.54g/cm3
Usage: Titanium Thin Film for coating
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    99.995% Pure Titanium Plate Titanium Sputtering Target


      High Quality Gr1 Pure Titanium Sputtering/ forging round Target

    99.995% Pure Titanium Plate Titanium Sputtering Target Titanium is recognized for its high strength-to-weight ratio. It is a strong metal with low density that is quite ductile (especially in an oxygen-free environment), lustrous, and metallic-white in color. The relatively high melting point (more than 1,650 C or 3,000 F) makes it useful as a refractory metal. It is paramagnetic and has fairly low electrical and thermal conductivity.

    Item NameTi target 99.999% Pure Ti Sputtering Titanium TargetTi target 99.999%
    ShapeRound target/according to your request
    Available size

    1.Ø30--2000mm, thickness 3.0mm--300mm

    2.Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm

    3.Customized is available

    CertificatesISO9001:2008, SGS, The third test report
    TechnicsForged and CNC Machined
    SurfaceCNC lathe surface.
    Application1. Electroplating;
    2. Chemical engineering & Petrochemical technology;
    3. Medical

    Other Metal Targets

    Jinxing matmetals in producing high density, ultra high purity (99.9% to 99.9999%) metal sputtering targets for all applications using both vacuum melt/casting and hot isostatic pressing (HIP) technology. Sputtering targets are available monoblock or bonded with dimensions up to 1500 mm. Research-sized targets are also available, as are custom sizes and alloy compositions.
    All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS) and Inductively Coupled Plasma (ICP).

    High pure metal sputtering target
    AluminumAlpellet,round,planar,rotatable target3N~6N
    ChroniumCrpellet,round,planar,rotatable target2N~3N5
    SilverAgpellet,round,planar,rotatable target4N~5N
    PlatinumPtpellet,round,planar,rotatable target4N~5N
    GoldAupellet,round,planar,rotatable target4N~5N
    NickelNipellet,round,planar,rotatable target4N~5N
    TinSnpellet,round,planar,rotatable target4N~6N
    ManganeseMnpellet,round,planar,rotatable target4N~5N
    CobaltCopellet,round,planar,rotatable target3N~4N
    IronFepellet,round,planar,rotatable target3N~4N
    ZincZnpellet,round,planar,rotatable target4N~5N
    ZirconiumZrpellet,round,planar,rotatable target2N2~4N
    TitaniumTipellet,round,planar,rotatable target4N~5N
    IndiumInpellet,round,planar,rotatable target4N~5N
    GermaniumGepellet,round,planar,rotatable target4N~6N
    SiliconSipellet,round,planar,rotatable target4N~6N
    CopperCupellet,round,planar,rotatable target4N~5N
    MolybdenumMopellet,round,planar,rotatable target3N~4N
    NiobiumNbpellet,round,planar,rotatable target3N5
    TatalumTapellet,round,planar,rotatable target4N5
    TungstenWpellet,round,planar,rotatable target3N5
    HafniumHfpellet,round,planar,rotatable target3N
    VanadiumVpellet,round,planar,rotatable target2N5~3N

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