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Hafnium Sputtering target

Country/Region china
Company JINXING METALS company
Categories Metal Name Plates
ICP License Issued by the Chinese Ministry
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    Hafnium Sputtering target

    Hafnium Sputtering target

    May 5, 2017
    | No Comments

    Hafnium Sputtering target

    Advantage:

    1.High quality and competitive price
    2.Timely delivery
    If any item you like,please contact us.
    Your sincere inquiries are typically answered within 24 hours.

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    Grade

    Hf+Zr;99.95%; Zr<1%, Zr<0.5%

    Shape: Round disc target, plate target

    GENERAL PROPERTIES:

    Symbol

    Hf

    Atomic Number

    72

    Atomic Weight

    178.49

    Density

    13.31 gm/cc

    Melting Point

    2227 oC

    Boiling Point

    4602 oC

    Thermal Conductivity

    0.230 W/cm/K @ 298.2 K

    Electrical Resistivity

    35.1 microhm-cm @ 25 oC

    Electronegativity

    1.3 Paulings

    Specific Heat

    0.035 Cal/g/K @ 25 oC

    Heat of Vaporization

    155 K-Cal/gm atom at 4602 oC

    Heat of Fusion

    6.0 Cal/gm mole

    Thermal Neutron Cross Section

    115 Barns

    Specification of tungsten Sputtering target:

    MG metal specializes in producing high purity Tungsten Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

    Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys.

    All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment.

    We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation.

    Why Choose JInxing?

    More than 3000 products are available.
    An ISO9001:2008,ISO14001,CE Certified.
    Offer you professional rare metal products and customized services.
    We feedback in 24 hours online and provide professional advice on products.
    With an annual output of 300 MT of tungsten & molybdenum and other precious metals.
    More than ten years experiences, Winning customers ’trust and satisfaction from all over the world.

    Our Factory:

    Hafnium Metal
    Buy Hafnium Sputtering target at wholesale prices
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